Thermal / Ebeam Evaporator system

Thermal / E-beam evaporator for thinfilm deposition

This is a 2 in 1 thermal and E-beam evaporator system

The ebeam gun power is 3 kW and the thermal power is 2kW.
The substrate holder is rotatable.

The big chamber area allows a 4 inches wafer to be placed into it.
For thermal evaporator, we are current working on materials such as Aluminum (Al), Silver (Ag), Copper (Cu) etc.
Customer can bring in their own source materials upon discussion with us.

Full view of the system
Internal view of the chamber

 

 

 

Full View of the system

 

 

 

Real time thickness measurement

 

 

 

 

 

 

 

If you need sample processing using this equipment,

Please kindly contact us.

 

Email address: laboratory.equipment.manager(a)gmail.com