Pulsed Laser Deposition is a method of thin-film, nanostructures or coating process. A high energy laser will be used to fire / shot on target to generate a plume with ions and atoms which will then be deposition on the substrate placed in front of the target. The stoichiometry of a compound will be almost exactly been transferred and deposited on the substrate.
![Pumping Down to High Vacuum](https://www.ukm.my/cfdee/wp-content/uploads/2018/06/IMG_20161103_143855_1-1024x577.jpg)
![Deposition of Au](https://www.ukm.my/cfdee/wp-content/uploads/2018/06/IMG_20161227_143825-577x1024.jpg)