Applications
Sample Requirements
Typical Result
Applications
The applications of FESEM include:
-
1
Semiconductor device cross section analyses for gate widths, gate oxides, film thicknesses, and construction details.
-
2
Advanced coating thickness and structure uniformity determination.
-
3
Small contamination feature geometry and elemental composition measurement.
Sample Requirements
-
1
Powder
-
2
Film
-
3
Solid
-
4
Dry
Typical Result
All enquiries please contact:
![](https://www.ukm.my/icrim/wp-content/uploads/2023/10/ENCIK-MOHAMAD-HASNUL-NAIM-ABD-HAMID-500x500-1.jpg)
MOHAMAD HASNUL NAIM ABD. HAMID
B.Sc. (UKM) Biochemistry
Email: hasnul@ukm.edu.my
Contact Number: 03-8911 8513
Location:
Level 3, i-CRIM Centralised Lab, Centre for Natural and Physical Laboratory Management UKM (ALAF-UKM), Research Complex UKM