Sains Malaysiana 41(1)(2012): 111–120

Pembangunan Bahan Fotopeka Silika Terdop Fosforus untuk Fabrikasi Pandu Gelombang Optik

(Development of Phosphorus Doped Silica Photosensitive Material for Optical Waveguide Fabrication)

Mohd Syuhaimi Ab-Rahman*, Hadi Guna & Sahbudin Shaari

Spectrum Technology Research Group, Fakulti Kejuruteraan & Alam Bina

Universiti Kebangsaan Malaysia, 43600 UKM Bangi, Selangor D.E.

Malaysia

Received: 14 December 2010 / Accepted: 16 May 2011

ABSTRAK

Kajian ini dijalankan untuk membangunkan pandu gelombang optik menggunakan bahan fotopeka silika terdop fosforus. Teknik penyalutan mejam menggunakan sumber berbentuk cecair iaitu tetraetil ortosilikat, asid fosforik dan juga PBF untuk menghasilkan pandu gelombang fotopeka silika terdop fosforus dan boron. Pada ketebalan antara 1 μm hingga 8 μm, modulasi indeks biasan yang ditunjukkan di dalam bahan fotopeka silika terdop fosforon-boron adala 1×10-14 pada ketebalan 3 μm hingga 8 μm. Semua ujian dan rawatan fotopeka dilakukan dengan menggunakan sumber UV 366 nm, 0.369 mW/cm2 pada kadar denyutan 50 Hz. Semua sampel menunjukkan penurunan nilai indeks di bawah dedahan ini. Tempoh dedahan yang diperlukan dengan menggunakan kuasa UV yang berkenaan adalah kira-kira 10 minit. Dengan menggunakan penyurih laser ArF atau KrF yang berkuasa 10 mW misalnya, tempoh dedahan yang diperlukan adalah cuma 20 hingga 30 saat untuk mengubah indeks biasan pandu gelombang. Selain daripada itu, proses pemampasan juga dimasukkan yang bertujuan untuk memperbetulkan semula prestasi akibat daripada kesan toleransi semasa proses simulasi. Bagi memberikan kecekapan dalam pengukuran indeks biasan dan ketebalan lapisan BPSG, satu program antara muka penggunaan grafik dibangunkan untuk mempercepatkan dan meningkatkan kejituan bacaan yang diukur daripada pengganding prisma manual.

Kata kunci: BER; Migrasi; OXADM; rangkaian cincin; rangkaian jejaring

ABSTRACT

This research was conducted to develop an optical waveguide made from phosphorus doped silica photosensitive material. The spin coating technique was conducted using a source in liquid form called tetraethyl orthosilicate, phosphoric acid and also PBF to produced phosphorus doped silica photosensitive waveguide and boron. In range between 1 μm and 8 μm thickness, the doped silica photosensitive waveguide, showed refractive index modulation is reaching 1×10-14 between 3 and 8 μm thickness. For each testing and photosensitive treatment process was run using a 366 nm UV source, 0.369 mW/cm2 at 50Hz pulse rate. For every samples produced from this exposure shows a deviation of their index value, which the UV exposure was held about 10 minutes. By using ArF or KrF laser inscriber with 10 mW power for example, exposure period needed was just between 20 to 30 seconds to change the refractive index of waveguide. Beside, compensation process also held to improve the performance due to the tolerance effect from the simulation process. In order to improve the efficiency of refractive index and the layer thickness of BPSG, a graphical user interface program has been successfully developed to accelerate and improve the accuracy of reading measured from manual prism coupler.

Keywords: Mesh network; migration; OXADM; ring network

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*Corresponding author; email: syuhaimi@eng.ukm.my