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Kata kunci:
Karbon nitrida;
PECVD;
saiz kelompok
ABSTRACK
The a-CNx thin
film has chemical bonding of C-N (sp3), C=N (sp2)
and C≡N (sp1).
C=N and C≡N bonds
are easily resolved by hydrogen attack during the film deposition
process to form C-H and N-H bonds. The formation of graphite
sp2 components
in the a-CNx thin
film caused by the presence of nitrogen atom contributes to
the reduction of the electrical resistance and enhances the
electrical conductivity. These features are essential for a-CNx thin
film application as a humidity sensor. In this study, amorphous
carbon nitride films (a-CNx) are deposited
on the quartz and silicon (111) substrate using PECVD techniques.
The samples were deposited at different RF power at 40, 50,
60, 70 and 80 W and analyzed their effects on film chemical
composition and films morphology as well as their ability as
humidity sensor. D (sp2C)
peak and G (sp3C) peak are clearly observed using
Raman spectroscopy in all a-CNx thin
films with the highest intensity obtained at RF 70
W. Films micrograph observed by field emission scanning electron
microscopy (FESEM)
show that surface morphology of all samples have a uniform structural
shape of cauliflower. X-ray photoelectron spectroscopy (XPS)
confirmed the presence of C-C/C=C, C=N and C≡N bonds
in the a-CNx thin
film. All the a-CNx thin
films showed a response to different humidity with sensitivity
between 60-70%. The a-CNx thin
film deposited at RF 70 W power indicates the highest sensitivity
due to carbon disorder and higher sp3C
content.
Keywords: Carbon nitride; cluster size; PECVD
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*Pengarang untuk surat-menyurat; email: rozida@ukm.edu.my
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